- Intel’s $20 billion Ohio fab project will create 3,000 direct jobs at an average salary of $135 k and 7,000 construction jobs, marking the largest single private investment in Ohio history and a major bet on post-Moore’s-Law domestic semiconductor capacity.  
- A 22 nm CMOS paper (auth2012.pdf) was highlighted for its fully-depleted tri-gate transistors, self-aligned contacts, and high-density MIM capacitors—technologies now entering volume production at the new Ohio site.  
- Participants debated whether U.S. chip fabs signal genuine technical competence or risk failure without sustained expertise, especially as Moore’s Law slows and legacy nodes remain economically valuable.  
- A PNAS paper on “Inverting the structure–property map of truss metamaterials by deep learning” was introduced as potentially more significant than the Intel news, raising questions about scalable fabrication of AI-designed mechanical metamaterials.  
- Concerns were voiced over the practical manufacturability of neural-network-generated metamaterial geometries, given current micro- and nano-fabrication constraints.  
- A link to “Analytic modeling of starshades” was shared, extending the channel’s ongoing interest in high-precision optics for exoplanet imaging and large-scale space engineering.