- Tachyon 2.0 lithography system reportedly delivers 4× the wafer-production capacity of the first-generation rack, suggesting a major leap in semiconductor throughput.  
- Hexapole illumination—described as a form of structured illumination—was highlighted as a key optical technique enabling higher-resolution patterning in high-volume manufacturing.  
- SPIE paper “Improvements in the imaging performance of a high-volume manufacturing system” (10.1117/12.2280379) was shared as a technical reference for the hexapole approach.  
- WebKit’s migration to GitHub (webkit.org/blog/13140/webkit-on-github/) was noted, reflecting broader open-source infrastructure trends relevant to reproducible bio/AI tooling.